Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

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Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid

Authors:	J Chiba Y Sugahara K Kuroda

Institution:	(1) Department of Applied Chemistry, School of Science and Engineering, Waseda University, Ohkubo-3, Shinjuku-ku, 169 Tokyo, Japan

Abstract:	Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and ²⁹Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me₂SiO(Me₂SiO)_nSiMe₂(OEt); n=0–4, Et = C₂H₅, Me = CH₃) and cyclic tetramer ((Me₂SiO)₄) were identified. The reaction mechanism for polysiloxane formation is discussed.

Keywords:	dimethyldiethoxysilane oxalic acids polydimethylsiloxane reaction mechanism non-aqueous system
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