Photothermal determination of vertical crack lengths in silicon nitride |
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Authors: | J. Rantala J. Hartikainen J. Jaarinen |
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Affiliation: | (1) Department of Physics, University of Helsinki, SF-00170 Helsinki, Finland;(2) Neste Corporate R&D, SF-06101 Porvoo, Finland |
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Abstract: | In this paper we describe the use of thermal microscopes in measuring the lengths of vertical cracks in silicon nitride. Results of theoretical calculations for temperature profiles in samples near the end of the cracks are demonstrated. These calculations showed that the effect of the crack decreases to a non-measurable level at distances of about 10 m from the end of the crack. Experimental measurements showed that thermally obtained crack lengths were at least 34% longer than those that were optically measured. The obtained crack length was independent of the heat modulation frequency used. |
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Keywords: | 44.30+v 07.20– n 07.60– j |
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