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Resistivity distribution of silicon single crystals using codoping
Authors:Jong Hoe Wang  
Institution:

Korea Institute of Ceramic Engineering and Technology, 233-5, Gasan-Dong, Guemcheon-Gu, Seoul 153-801, Republic of Korea

Abstract:Numerous studies including continuous Czochralski method and double crucible technique have been reported on the control of macroscopic axial resistivity distribution in bulk crystal growth. The simple codoping method for improving the productivity of silicon single-crystal growth by controlling axial specific resistivity distribution was proposed by Wang Jpn. J. Appl. Phys. 43 (2004) 4079]. Wang J. Crystal Growth 275 (2005) e73] demonstrated using numerical analysis and by experimental results that the axial specific resistivity distribution can be modified in melt growth of silicon crystals and relatively uniform profile is possible by B–P codoping method. In this work, the basic characteristic of 8 in silicon single crystal grown using codoping method is studied and whether proposed method has advantage for the silicon crystal growth is discussed.
Keywords:A1  Doping  A1  Segregation  A2  Czochralski method  A2  Growth from melt  A2  Single-crystal growth  B2  Semiconducting silicon
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