| 微小等离子体反应器的导出机理研究 |
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| 引用本文： | 王海,童云华,文莉.微小等离子体反应器的导出机理研究[J].核聚变与等离子体物理,2011,31(1):91-96. |
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| 作者姓名： | 王海 童云华 文莉 |
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| 作者单位： | (1. 安徽工程大学机械与汽车工程学院,芜湖 241000;2. 安徽省先进数控和伺服驱动技术重点实验室,芜湖 241000;3. 中国科学技术大学精密机械与精密仪器系,合肥 230027) |
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| 基金项目： | 国家自然科学基金资助项目,江苏省微纳生物医疗器械设计与制造重点实验室资助 |
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| 摘 要： | An extraction mechanism based on micronozzle in the bottom of the microhollow cathode and applied bias electrical field is proposed, and digitally simulated with a two dimensional fluid model. When the operating gas is SF6 and its pressure is 2~9kPa, radius of the micronozzle is 0.25μm, maximum F atom flux density is between (1.53~5.62)×1014cm-3·s-1, maximum SF5+ flux density is between (2.46~7.83)×1016cm-3·s-1. When gas pressur is 5kPa,average energy of F atom at sample surface is 3.82eV, dispersion angle is ?14º~14º; average energy of SF is 25eV, dispersion angle is ?13º~14º. When applied voltage across hollow cathode and sample is between 10~50V (sample as cathode), average energy of SF is between 52~58eV. The density of F and SF in the simulation result could satisfy the requirement for silicon etching, and the feasibility of scanning plasma etching validated.
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| 关 键 词： | 扫描等离子体刻蚀加工 微小等离子体反应器 导出机制 |
| 收稿时间： | 2010-08-05 |
| 修稿时间： | 2010-11-23 |
Research of extraction mechanism for microplasma reactor |
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| WANG Hai,TONG Yun-hua,WEN Li.Research of extraction mechanism for microplasma reactor[J].Nuclear Fusion and Plasma Physics,2011,31(1):91-96. |
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| Authors: | WANG Hai TONG Yun-hua WEN Li |
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| Institution: | (1. School of Mechanical and Automotive Engineering, Anhui Polytechnic University, Wuhu 241000; 2. Advanced Numerical Control & Servo Driving Technology Key Lab of Anhui, Wuhu 241000;3. Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230027) |
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| Abstract: | An extraction mechanism based on micronozzle in the bottom of the microhollow cathode and applied bias electrical field is proposed, and digitally simulated with a two dimensional fluid model. When the operating gas is SF6 and its pressure is 2~9kPa, radius of the micronozzle is 0.25μm, maximum F atom flux density is between (1.53~5.62)×1014cm-3·s-1, maximum SF5+ flux density is between (2.46~7.83)×1016cm-3·s-1. When gas pressur is 5kPa,average energy of F atom at sample surface is 3.82eV, dispersion angle is ?14º~14º; average energy of SF | |
| Keywords: | Scanning plasma etching Microplasma reactor Extraction mechanism |
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