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Growth of transparent conducting nano-structured In doped ZnO thin films by pulsed DC magnetron sputtering |
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| Authors: | Young Ran Park Donggeun Jung Young Sung Kim |
| Affiliation: | a Department of Physics, Institute of Basic Science and Center for Nanotubes and Nanocomposites, Sungkyunkwan University, Suwon 440-746, Korea b Department of information and communication, Sungkyunkwan University, Suwon 440-746, Korea c Advanced Material Process of Information Technology, Sungkyunkwan University, Suwon 440-746, Korea |
| Abstract: | Transparent conducting nano-structured In doped zinc oxide (IZO) thin films are deposited on corning 7059 glass substrates by bipolar pulsed DC magnetron sputtering with variation of pulsed frequency and substrate temperature. Highly c-axis oriented IZO thin films were grown in perpendicular to the substrate on the 30 kHz and 500 °C. The IZO films exhibited surface roughness of 3.6 nm similar to the commercial ITO and n-type semiconducting properties with electrical resistivity (carrier mobility) of about 5 × 10−3 Ω cm (14 cm2/V s). The optical characterization showed high transmittance of over 85% in the UV-vis region and exhibited the absorption edge of near 350 nm. In micro-Raman spectra, the origin of two additional modes is attributed to the host lattice defect due to the addition of In dopant. These results suggest that the IZO film can possibly be applied to make transparent conducting electrodes for flat panel displays. |
| Keywords: | Nano-structured Pulse DC magnetron sputtering In doped ZnO (IZO) Transparent conducting oxide (TCO) |
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