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Near-stoichiometric Ti:LiNbO3 strip waveguide with varied substrate refractive index in waveguide layer
Authors:Zhang De-Long  Wu Chang  Pun Edwin Yue-Bun
Affiliation:[1]School of Precision Instruments and Opto-electronics Engineering, Tianjin University, Tianjin 300072, China, and Key Laboratory of Optoelectronics Information Science and Technology, Ministry of Education, Tianjin 300072, China [2]Department of Electronic Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR, China
Abstract:
We report the near-stoichiometric Ti:LiNbO3 stripwaveguides fabricated by vapour transport equilibration (VTE) at1060~^{circ}C for 12 h and co-diffusion of 4--8~mu m wide,115-nm thick Ti-strips. Optical studies show that these waveguidesare monomode at 1.5~mu m and have losses of 1.3 and 1.1~dB/cm forthe TM and TE modes, respectively. In the waveguide width/depthdirection, the mode field follows a Gauss/Hermite--Gauss profile.A secondary ion mass spectrometry study reveals that the Ti profilefollows a sum of two error functions along the width direction and acomplementary error function in the depth direction. Micro-Ramananalysis shows that the Li-composition in the depth directionalso follows a complementary error function. The mean Li/Nb ratio inthe waveguide layer is about 0.98. The inhomogeneous Li-compositionprofile results in a varied substrate index in the guiding layer,and the refractive index profile in the guiding layer is given.
Keywords:near-stoichiometric Ti:LiNbO3 strip waveguide   variedsubstrate refractive index   Li-compositionprofile   2D refractive index profile
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