Analysis of Cu segregation to oxide–metal interface of Ni‐based alloy in a metal‐dusting environment |
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| Authors: | Takashi Doi Kazuyuki Kitamura Yoshitaka Nishiyama Nobuo Otsuka Takeo Kudo Masugu Sato Eiji Ikenaga Shigenori Ueda Keisuke Kobayashi |
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| Affiliation: | 1. Corporate Research and Development Laboratories, Sumitomo Metal Industries, Ltd.,1‐8 Fuso‐cho, Amagasaki, Hyogo 660‐0891, Japan;2. Japan Synchrotron Radiation Research Institute, 1‐1‐1 Kouto, Sayo‐cho, Sayo‐gun, Hyogo 679‐5148, Japan;3. National Institute for Materials Science (NIMS) SPring‐8, 1‐1‐1 Kouto, Sayo‐cho, Sayo‐gun, Hyogo 679‐5148, Japan |
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| Abstract: | Hard X‐ray photoelectron spectroscopy (HX‐PES) has been realized using high‐brilliance synchrotron radiation. High‐energy photon excitation enables us to probe photoelectrons with larger escape depth compared to conventional PES. This allows us to conduct, without destruction, a study of the embedded interface of materials as the oxide‐ metal interface. We apply HX‐PES to investigate for Cu segregation in the oxide–metal interface during metal‐dusting corrosion. The effective concentration of Cu in the segregation was estimated a few times higher than the bulk concentration. These results on the interface layer can explain the variation in the corrosion resistance. Copyright © 2008 John Wiley & Sons, Ltd. |
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| Keywords: | HX‐PES Cu segregation metal dusting |
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