(1) Foundation for Research and Technology-Hellas, Institute of Electronic Structure and Laser, FORTH-IESL, P.O. Box 1527, 71110, Hellas (Fax: +30-81/391318, E-mail: vainos@iesl.forth.gr), GR
Abstract:
2 O3 on glass and silicon substrates is performed. The superior quality of the results allows the direct, one-step fabrication of binary-amplitude and multilevel optical diffractive structures. Received: 4 February 1998/Accepted: 9 February 1998