首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Different charging behaviors between electrons and holes in Si nanocrystals embedded in SiN_x matrix by the influence of near-interface oxide traps
Authors:Fang Zhong-Hui;Jiang Xiao-Fan;Chen Kun-Ji;Wang Yue-Fei;Li Wei;Xu Jun
Institution:State Key Laboratory of Solid State Microstructures and School of Physics, Nanjing University, Nanjing 210093, China
Abstract:
Keywords:silicon nanocrystals memory  different charging of electrons and holes  oxide traps  admittance-voltage characteristics
本文献已被 CNKI 等数据库收录!
点击此处可从《中国物理 B》浏览原始摘要信息
点击此处可从《中国物理 B》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号