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Diagnosis of phasma in CCD damage process induced by laser
引用本文:Jian Lu,Xiao wu Ni,An-zhi He(Department of Applied Physics,Nanjing University of Science Technology,200 Xiaolingwei,Nanjing 210014,China). Diagnosis of phasma in CCD damage process induced by laser[J]. Chinese Journal of Lasers, 1993, 2(5): 463-467
作者姓名:Jian Lu  Xiao wu Ni  An-zhi He(Department of Applied Physics  Nanjing University of Science Technology  200 Xiaolingwei  Nanjing 210014  China)
作者单位:Department of Applied Physics,Nanjing University of Science Technology,200 Xiaolingwei,Nanjing 210014,China
基金项目:In this paper, the shapes of plasma produced by a Q -switched YAG laser acted repeatedly upon a CCD with MOS structure are used, to investigate the destroying process of the optoelectronic device. The experjmental results of CCD destroyed by a 1. 06μm laser beam with a pulse width of 15 ns are given.
摘    要:
In this paper, the shapes of plasma produced by a Q-switched YAG laser acted repeatedly upon a CCD with MOS structure are used, to investigate the destroying process of the optoelectronic device. The experimental results of CCD destroyed by a 1.06μm laser beam with a pulse width of 15 ns are given.

收稿时间:1993-05-19

Diagnosis of phasma in CCD damage process induced by laser
Jian Lu,Xiao wu Ni,An-zhi He. Diagnosis of phasma in CCD damage process induced by laser[J]. 中国激光(英文版), 1993, 2(5): 463-467
Authors:Jian Lu  Xiao wu Ni  An-zhi He
Abstract:
In this paper, the shapes of plasma produced by a Q-switched YAG laser acted repeatedly upon a CCD with MOS structure are used, to investigate the destroying process of the optoelectronic device. The experimental results of CCD destroyed by a 1.06μm laser beam with a pulse width of 15 ns are given.
Keywords:CCD device   MOS structure   laser damage   optical breakdown   plasma
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