| 氧偏压对ZnO薄膜结构的影响 |
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| 引用本文： | 张丽明,刘万玲. 氧偏压对ZnO薄膜结构的影响[J]. 化学研究, 2008, 19(2): 88-90 |
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| 作者姓名： | 张丽明 刘万玲 |
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| 作者单位： | 商丘职业技术学院,河南,商丘,476000 |
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| 摘 要： | 采用磁控溅射方法在ITO玻璃上成功制备了具有良好c轴取向的ZnO薄膜．并研究了氧偏压对ZnO薄膜结构的影响、研究发现：当氧偏压为60％时，薄膜的结晶性最好．当氧偏压继续升高时将导致薄膜的结晶性变差，晶粒尺寸变小，晶界增多，薄膜表面粗糙度增加，对光的散射和吸收作用增强，从而导致光的透过率降低．
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| 关 键 词： | ZnO薄膜 氧偏压 XRD 透射率 |
Influence of P(O2) on the Construction of ZnO Thin Films |
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| ZHANG Li-ming,LIU Wan-ling. Influence of P(O2) on the Construction of ZnO Thin Films[J]. Chemical Research, 2008, 19(2): 88-90 |
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| Authors: | ZHANG Li-ming LIU Wan-ling |
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| Affiliation: | ( Shangqiu Vocational Technology College, Shangqiu 476000, Henan, China) |
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| Abstract: | Prepared ZnO thin film on ITO substrate by magnetron sputtering.The influence of P(O2) on the construction of ZnO thin films was investigated.It was found that when P(O2) was 60%,the film has the best crystallization property. |
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| Keywords: | ZnO thin film P(O2) XRD transmissivity |
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