Carbon reduction and antimony incorporation in InGaAsSb films grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony |
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Authors: | Manabu Mitsuhara Tomonari SatoNorio Yamamoto Hideki FukanoYasuhiro Kondo |
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Affiliation: | NTT Photonics Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan |
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Abstract: | InGaAsSb layers nearly lattice-matched to InP were grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony (TDMASb). Secondary-ion mass spectroscopy measurements revealed that TDMASb is useful not only as an Sb source but also as an additive that reduces the incorporation of C into the film from group-III metalorganic sources. In the room-temperature photoluminescence spectrum, the incorporation of Sb into InGaAs shifted the peak wavelength from 1.66 to 1.75 μm and, simultaneously, the peak intensity of InGaAsSb became more than twice that of InGaAs. |
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Keywords: | 81.15.Hi 82.80.Ms 78.55.Cr 81.05.Ea |
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