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RHEED observation of BaTiO3 thin films grown by MBE
Authors:Y. Yoneda  K. SakaueH. Terauchi
Affiliation:a Department of Synchrotron Radiation Fac., Japan Atomic Energy Research Institute (JAERI), 1-1-1 Kouto, Mikazuki-cho, Sayo-gun, Hyogo 679-5148, Japan
b Department of Physics, Kwansei-Gakuin University, Sanda, Hyogo 669-1337, Japan
Abstract:Ferroelectric BaTiO3 thin films with a thickness of 10 monolayers (ML) were epitaxially grown on SrTiO3(0 0 1) substrates by very slow deposition using molecular beam epitaxy (MBE). The investigations were carried out by two growth methods: (i) codeposition and (ii) alternate deposition of the metal elements in an oxygen atmosphere. In situ observation of reflection high-energy electron diffraction confirmed that an epitaxial cube-on-cube structure was prepared. After the deposition, X-ray diffraction measurements were carried out. The 10-ML-thick BaTiO3 films were highly c-axis oriented single crystals with good film quality.
Keywords:Reflection high-energy electron diffraction (RHEED)   X-ray scattering, diffraction, and reflection   Surface relaxation and reconstruction   Surface structure, morphology, roughness, and topography   Growth   Molecular beam epitaxy
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