Multiple processes during the sputtering of materials by ion bombardment |
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| Authors: | B. L. Oksengendler S. E. Maksimov N. N. Turaeva N. Yu. Turaev |
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| Affiliation: | 1. Institute of Ion-Plasma and Laser Technology, Uzbek Academy of Sciences, Tashkent, 100125, Uzbekistan
2. Institute of Chemistry and Physics of Polymers, Uzbek Academy of Sciences, Tashkent, 100128, Uzbekistan
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| Abstract: | A new method of statistical analysis dedicated to filling the gap between dynamic and thermodynamic theories of secondary-particle emission under ion bombardment is proposed. Expressions for the average number of emitted atomic particles and electrons are obtained, and the relationships between their yields are established. |
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