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Inhomogeneous depth distribution of fluorine atoms in PVDF upon radiative carbonization |
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| Authors: | L. A. Pesin V. P. Andreichuk V. M. Morilova I. V. Gribov N. A. Moskvina V. L. Kuznetsov S. E. Evsyukov O. V. Koryakova A. D. Mokrushin E. V. Egorov |
| Affiliation: | 1. Chelyabinsk State Pedagogical University, Chelyabinsk, Russia 2. Snezhinsk Physics and Technology Institute, Snezhinsk, Russia 3. Institute of Metal Physics, Ural Branch, Russian Academy of Sciences, Yekaterinburg, Russia 4. Evonik Industries AG, Dossenheim, Germany 5. Institute of Organic Synthesis, Ural Branch, Russian Academy of Sciences, Yekaterinburg, Russia 6. Institute of Microelectronics Technologies and High Purity Materials, Russian Academy of Sciences, Chernogolovka, Russia |
| Abstract: | Under the action of ionizing radiation on a PVDF film, fluorine and hydrogen atoms bound to its linear carbon chain with single chemical bonds detach. Free atoms and HF molecules diffuse toward the film surface and escape from it. As a result of irradiation of the sample surface, a fluorine concentration depth profile arises. The fluorine distribution in the PVDF films subjected to long-term X-ray exposure was studied using X-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. Both methods yield close values of the fluorine concentration at a depth of ～10 nm. |
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