Enhanced ablation of silica by the superposition of femtosecond and nanosecond laser pulses |
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Authors: | F Théberge SL Chin |
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Institution: | (1) Centre d Optique, Photonique et Laser, Laval University, Cité Universitaire, Québec, G1K 7P4, Canada |
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Abstract: | We investigate the ablation process in SiO2 by the superposition of 180 fs laser pulse ( center=800 nm) with a 15 ns laser pulse ( center=532 nm). Compared to femtosecond laser pulses alone, we measured an increase of 270±30% in volume of the ejected material with only a total increase of 40% of lasers fluences. This increase of ablation is the result of thermal and incubation effects generated by the femtosecond laser pulse. PACS 78.20.Nv; 61.80.Ba |
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