Conducting-AFM spectroscopy on ultrathin SiO2 films |
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Authors: | A. Ando K. Miki R. Hasunuma Y. Nishioka |
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Affiliation: | (1) Freescale Semiconductor, US;(2) Binghamton University, bruce; |
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Abstract: | We study the dielectric degradation phenomena of ultrathin SiO2 films using conducting-AFM spectroscopy in a vacuum (1᎒-5 Pa). In successive current-voltage characteristics, a change of the carrier transport (from Fowler-Nordheim tunneling to direct tunneling) and current instability (which is due to a change in conductance of leakage path by isolated traps) are observed before 'breakdown'. As an example of a possible application of conducting-AFM spectroscopy, we investigate a change in conductivity at a 'breakdown' area. |
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