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Properties of nanostructured and amorphous films in the TiB2-B4C system
Authors:G. V. Kalinnikov  R. A. Andrievski  V. N. Kopylov  D. Louzguine
Affiliation:(1) Institute of Problems of Chemical Physics, Russian Academy of Sciences, pr. Akademika Semenova 1, Chernogolovka, Moscow oblast, 142432, Russia;(2) Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka, Moscow oblast, 142432, Russia;(3) Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
Abstract:
Nanostructured and x-ray-amorphous films in the TiB2-B4C system are prepared by nonreactive magnetron sputtering in the absence and presence of an additional external magnetic field with inductions of up to 0.3 T. The properties of the deposited films, such as the grain size, phase composition, dominant texture, roughness, and hardness, are investigated using transmission electron microscopy, microdiffraction, x-ray powder diffraction, atomic force microscopy, and microdurometry. The specific features of the phase diagram as applied to films and the effect of application of the magnetic field on their properties are discussed.
Keywords:
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