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自支撑Zr膜制备及软X射线透过性能研究
引用本文:伍和云,吴永刚.自支撑Zr膜制备及软X射线透过性能研究[J].光子学报,2011,40(1):1-4.
作者姓名:伍和云  吴永刚
作者单位:1. 同济大学物理系2.
摘    要:软X射线波段滤光膜材料大都为自支撑金属薄膜,实验室环境下自支撑薄膜长期与空气接触表面易氧化,空气中的杂质原子进入自支撑薄膜内部,致使自支撑膜光学性能大幅下降.5 nm至20 nm软X射线波段Zr具有较低的质量吸收系数和较小的密度,在该波段Zr滤光膜透过率较高.采用脱模剂法制备自支撑Zr膜,在洁净的浮法玻璃上蒸镀一层Na...

关 键 词:自支撑薄膜  软X射线  脱模剂  磁控溅射  同步辐射
收稿时间:2010-06-17
修稿时间:2010-08-09

Preparation and Research on Self-supported Zr Filter
Abstract:Filters for soft-x-ray are mostly self-supported metal thin films. Under experimental circumstance, while long exposure to the air of the self-supported metal thin film, impurity atoms will enter into self-supported thin film, which would result in decline of self-supported thin film’s optics performance. Zr filters have high transmittance at band from 5nm to 20nm because of its low mass absorption coefficient and density. After vapor depositing NaCl film on cleaned float glass as a release agent, Zr film was sputtered on NaCl film. Self-supported Zr film is prepared after NaCl film is dissolved in deionized water. To prevent surface oxidizing and impurity atoms from the air entering Zr film in experimental environment, C or Si film with 10 nanometer thickness is sputtered on both Zr film sides for separating Zr from the air. Measurement result of C/Zr/C and Si/Zr/Si film shows that C or Si film has little influence on self-supported Zr film performance.
Keywords:self-supported thin film  Extreme ultra violet(EUV)  release agent  magnetron sputtering  synchrotron radiation
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