Anomalous Hall effect in sputter-deposited CoxTi1−xO2–δ films |
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Authors: | B-S Jeong SJ Pearton YW Heo DP Norton AF Hebard |
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Institution: | 1. Department of Materials Science and Engineering, University of Florida, 100 Rhines Hall, P.O. Box 116400, Gainesville, FL 32611, USA;2. Department of Physics, University of Florida, Gainesville, FL 32611-8440, USA |
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Abstract: | Hall effect measurements were performed on epitaxial CoxTi1−xO2–δ thin films grown on (0 0 1) LaAlO3 by reactive RF magnetron co-sputter deposition. Magnetization measurements reveal ferromagnetic behavior in M–H loop at room temperature for CoxTi1−xO2–δ thin films for which x?0.02. An anomalous Hall effect was observed for Co0.10Ti0.90O2−δ films grown with the partial pressure of water P(H2O)=4×10−4 Torr or less. These films exhibit a positive ordinary Hall coefficient and a positive magnetoresistance. X-ray diffraction on films grown under these conditions shows evidence for TinO2n−1 phase due to the deficiency of oxygen. In contrast, Hall measurements taken for undoped and Co-doped TiO2 thin films grown under more oxidizing conditions show only the ordinary Hall effect with a negative Hall coefficient consistent with n-type conduction. For these films, the magnetoresistance was positive and increased monotonically with increasing magnetic field. The results suggest that Co-doped TinO2n−1 may be a dilute magnetic semiconducting oxide for which the carriers couple to the spin polarization. |
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Keywords: | 72 25 Dc 81 15 Cd |
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