Direct solid sampling electrothermal vaporization of alumina for analysis by inductively coupled plasma optical emission spectrometry

A procedure based on electrothermal evaporation (ETV) and inductively coupled plasma atomic emission spectrometry (ICP-OES) for the determination of trace impurities in Al₂O₃ powders without any sample pretreatment is presented. With the aid of matrix modifier the transport and the evaporation efficiency for refractory compounds could be increased by forming halides with a lower boiling point. As calibration is still a problem in direct solid sample analysis, different calibration approaches including the use of certified reference materials from NIST and standard addition of aqueous solutions of analytes were discussed. The accuracy obtained with calibration and with the standard addition method was shown up for the elements Ca, Fe, Ga, Mg, Mn, Na, Ni and V for the case of Al₂O₃ NIST standard reference material (SRM 699). The ETV–ICP-OES method was used for the analysis of Al₂O₃ powders with impurities in the low μg/g range and the results for the elements Ca, Fe, Ga, Mg, Mn, Na, Ni and V obtained with evaporation of discrete powder amounts with ETV–ICP-OES and slurry evaporation under the use of ultrasonic homogenization during the sampling and ETV–ICP-MS were shown to be in a good agreement.