| 强流脉冲离子束辐照混合双层靶的Monte Carlo模拟 |
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| 引用本文： | 吴迪,王静,张建红,宫野. 强流脉冲离子束辐照混合双层靶的Monte Carlo模拟[J]. 计算物理, 2010, 27(3): 423-427 |
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| 作者姓名： | 吴迪 王静 张建红 宫野 |
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| 作者单位： | 1. 大连大学物理科学与技术学院, 辽宁 大连 116622;2. 大连理工大学三束实验室, 辽宁 大连 116024 |
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| 基金项目： | 中国博士后科学基金(20060400967);;大连大学博士启动基金(SBQ200810)资助项目 |
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| 摘 要： | 采用Monte Carlo方法模拟强流脉冲离子束与铝基钛膜双层靶的相互作用.强流脉冲离子束与双层靶材相互作用过程中,随着离子的注入,高能离子束引起涂层原子与基体材料原子之间相互渗透和混合,同时离子能量沉积到靶材内一定深度,并呈规律性的空间分布.这种能量分布影响靶内两种材料的熔化或气化过程,并导致界面物质结合强度发生变化.利用建立的束流模型,计算束流在靶材内的能量沉积和分布状况及界面处级联碰撞对双层靶界面混合区的影响,得出强流脉冲离子束混合双层靶时级联碰撞不起主要作用的结论,离子流密度在100A·cm-2~150A·cm-2时对离子束混合最为有利.
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| 关 键 词： | 强流脉冲离子束 双层靶 辐照混合 Monte Carlo |
| 收稿时间： | 2008-12-12 |
| 修稿时间： | 2009-06-21 |
Monte Carlo Study of Ti Film on Al Substrate Under High-intensity Pulsed Ion Beam Irradiation |
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| WU Di,WANG Jing,ZHANG Jianhong,GONG Ye. Monte Carlo Study of Ti Film on Al Substrate Under High-intensity Pulsed Ion Beam Irradiation[J]. Chinese Journal of Computational Physics, 2010, 27(3): 423-427 |
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| Authors: | WU Di WANG Jing ZHANG Jianhong GONG Ye |
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| Affiliation: | 1. College of Physical Science and Technology, Dalian University, Dalian 116622, China;2. Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China |
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| Abstract: | Monte Carlo method is used to simulate ions in a double-layer target of Ti film on Al substrate.As high-intensity pulsed ion beam (HIPIB) irradiates on target,deposited energy results in rapid increase of surface temperature.Meanwhile high energy ions make cross mixing among atoms at film and substrate interface.Shooting ions and energy deposition influence melting or vaporization of target materials.It changes adhesion between film and substrate.It shows that cascade collision mixing is not a main process ... |
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| Keywords: | high-intensity pulsed ion beam double-layer target mixing Monte Carlo |
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