| 基于厚金属狭缝阵列的表面等离子激元光刻 |
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| 引用本文： | 肖啸,肖志刚,许德富,邓迟,刘晓云.基于厚金属狭缝阵列的表面等离子激元光刻[J].光子学报,2011(9):1381-1385. |
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| 作者姓名： | 肖啸 肖志刚 许德富 邓迟 刘晓云 |
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| 作者单位： | 乐山师范学院物理与电子工程学院;四川大学物理科学与技术学院纳光子技术研究所; |
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| 基金项目： | 乐山师范学院科研项目资助 |
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| 摘 要： | 提出一种利用厚金属狭缝阵列耦合激发表面等离子激元制作非周期图形的纳米光刻模型.采用时域有限差分电磁场模拟仿真软件研究了厚金属狭缝阵列中表面等离子激元的激发、模式选择以及光刻胶中的光场分布.结果表明,通过优化厚金属狭缝阵列结构参量和匹配介质参量可有效抑制表面等离子激元在光栅狭缝出口处的发散,增加表面等离子激元的穿透深度,...
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| 关 键 词： | 光刻 厚金属狭缝 时域有限差分法 表面等离子激元 |
Surface Plasmon Polaritions Lithography Based on Thick Metallic Slit Arrays |
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| XIAO Xiao,XIAO Zhi-gang,XU De-fu,DENG Chi,LIU Xiao-yun.Surface Plasmon Polaritions Lithography Based on Thick Metallic Slit Arrays[J].Acta Photonica Sinica,2011(9):1381-1385. |
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| Authors: | XIAO Xiao XIAO Zhi-gang XU De-fu DENG Chi LIU Xiao-yun |
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| Institution: | XIAO Xiao1,XIAO Zhi-gang1,XU De-fu1,DENG Chi1,LIU Xiao-yun2(1 College of Physics and Electronic Engineering,Leshan Normal University,Leshan,Sichuan 614004,China)(2 Institute of Physics Science and Technology,Sichuan University,Chengdu 610064,China) |
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| Abstract: | A surface plasmon polaritons lithography model was presented based on thick metallic slit arrays to fabricate aperiodic nanostructures.The excitation of surface plasmon polaritons,model selection in thick metallic slit arrays and the intensity distribution in photoresist were studied carefully with finite-difference time-domain method.The results show that the diffusion of surface plasmon polaritons on slits can be inhibited,and the exposure depth is enhanced by optimizing the slits structure and matching m... |
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| Keywords: | Lithography Thick metallic slits Finite-Difference Time-Domain(FDTD) Surface Plasmon Polaritons(SPP) |
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