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High-performance 4H-SiC junction barrier Schottky diodes with double resistive termination extensions
Authors:Zheng Liu  Zhang Feng  Liu Sheng-Bei  Dong Lin  Liu Xing-Fang  Fan Zhong-Chao  Liu Bin  Yan Guo-Guo  Wang Lei  Zhao Wan-Shun  Sun Guo-Sheng  He Zhi  and Yang Fu-Hua
Institution:[1]Key Laboratory of Semiconductor Material Sciences, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China [2]Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
Abstract:4H-SiC, junction barrier Schottky (JBS) diode, high-temperature annealed resistive terminationextension (HARTE)
Keywords:4H-SiC  junction barrier Schottky (JBS) diode  high-temperature annealed resistive terminationextension (HARTE)
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