| Abstract: | A novel poly(σ‐hydroxyamide) (PHA) based photosensitive polymer that exhibits high transparency at 365 nm wavelength (i‐line) has been developed. Time‐dependent density functional theory (TD‐DFT) calculations using the B3LYP hybrid functional were performed to predict the transparencies of various hydroxyamides in the i‐line region. Based on the calculations, 4,4′‐sulfonylbis(σ‐aminophenol) (SAP) was prepared and polymerized with 4,4′‐oxybis(benzoyl chloride) (OBBC), and the resulting PHA, which is abbreviated as PHA‐S, showed a high transparency comparable to that of PHA derived from 4,4′‐(hexafluoroisopropylidene)bis(σ‐aminophenol). Positive‐type photosensitive PHA was then formulated based on PHA‐S with a crosslinker 1,3,5‐tris(2‐vinyloxy)ethoxy]benzene (TVEB) and a photoacid generator (5‐propylsulfonyloxyimino‐5H‐thiophen‐2‐ylidene)‐2‐(methylphenyl)acetonitrile (PTMA) (17:3:1 in weight ratio), and demonstrated photosensitivity and contrast of 14 mJ/cm2 and 2.7, respectively, when the resist film was prebaked at 120 °C for 5 min, irradiated by i‐line, post exposure baked at 120 °C for 5 min, developed with an 2.38 wt% TMAH solution for 5 s. A clear positive image featuring 10‐μm line‐and‐space was also printed in a film which was exposed to 50 mJ/cm2 of i‐line by contact‐printing. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 2527–2535, 2005 |
