Thermal stability of adsorbed CH3NCO on Cu{110} AND Pt{110} from vibrational and photoelectron spectroscopies |
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| Authors: | Mark Surman F Solymosi Renee D Diehl Peter Hofmann David A King |
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| Institution: | The Donnan Laboratories, The University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK |
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| Abstract: | The thermal stability of CH3NCO adsorbed on Cu{110} and Pt{110} is investigated using HREELS, TPD, and ARUPS. CH3NCO desorbs largely without fragmentation from Cu{110}, but on Pt{110} only about 20% of the adsorbed CH3NCO desorbs intact, with 80% decomposing on the surface at T > 200 K into CO(a), H(a), CHx(a), N(a) and NHy(a) fragments. The kinetics of the surface decomposition were characterised for 220 < T < 300 K by HREELS and the activation energy for CH3NCO decomposition was found to vary strongly as a function of coverage. |
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