平面靶直流溅射制备YBCO高温超导薄膜研究

开展了平面靶溅射法制备YBa2Cu3O7-δ(YBCO)高温超导薄膜工艺研究,以达到提高沉积速率的目的。通过增加工作气体总压(Pt),采用基片旋转达到离轴溅射模式,有效地克服了传统平面靶直流溅射法中高能粒子轰击和负离子反溅射现象。在两英寸LaA lO3(LAO)基片上成功外延生长得到了微观结构良好、电学性能优越(临界电流密度Jc=2.3/2.0mA/cm2)的双面YBCO高温超导薄膜。

Preparation and characterization of YBCO thin films by plane target sputtering

In this paper,YBa2Cu3O7-δ(YBCO) high temperature superconducting films were grown on 2-inch LaAlO3(001) single crystal substrates using plane target sputtering.Replacing inverted cylinder target sputtering with plane target sputtering could enhance the deposition rate very effectively,but the new problem of the high-energy and negative ions bombardment effect would be brought in for the shape of the plane target.In order to avoid this kind of effect,the methods of increasing the total gas pressure and rolling the substrate periodically were adopted,which has been proved to be effective in reducing the negative ions bombardment and finally enhancing the quality of films.High quality YBCO films were fabricated with excellent structure and good superconductivity(the critical current density Jc =2.3/2.0MA/cm) by using this improved plane target sputtering method.