SF6-sensitized dissociation of UF6 with a pulsed CO2 laser |
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Authors: | Chin Chi-tsung Hou Hui-qi Bao Yi-han Li Ting-hua |
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Institution: | Department of Nuclear Science, Fudan University, Shanghai, People''s Republic of China |
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Abstract: | The dissociation of UF6 sensitized by SF6 excited with a pulsed CO2 laser in the presence of H2 and CO as scavengers has been investigated. In the SF6-UF6-H2 system the dissociation yields have been determined as a function of the laser frequency, the fluence, and H2 partial pressure. A maximum dissociation yield has been found at a laser frequency of 935 cm?1. No obvious dissociation of UF6 was observed in the UF6-SF6 system without F-atom scavengers. |
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