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| 氢等离子体处理——一种有效提高碳纳米管场发射性能的方法 | |
| 引用本文： | 张继华,冯涛,于伟东,王曦,柳湘怀. 氢等离子体处理——一种有效提高碳纳米管场发射性能的方法[J]. 光散射学报, 2003, 15(1): 6-9 |
| 作者姓名： | 张继华 冯涛 于伟东 王曦 柳湘怀 |
| 作者单位： | 中国科学院上海微系统与信息技术研究所粒子束重点实验室,上海市长宁路865号,200050 |
| 基金项目： | 国家重点基础研究发展计划(973计划)，G2000067207-2， |
| 摘 要： | 研究了经氢等离子体处理后多壁碳纳米管的场发射性能。测量了处理前后样品的电流电压特性和表面形貌。结果表明经氢等离子体处理后,发射性能明显改善,发射点密度由未经处理的104/cm2提高到106/cm2。发现了一种新的碳纳米管结构,称之为多结的碳纳米管,并讨论了样品发射性能提高的可能机理。这种处理提供了一种有效提高发射点密度和基于碳纳米管的平板显示器性能的方法,非常适用于低成本大面积场发射阴极的制作。 |
| 关 键 词： | 碳纳米管 场发射 氢等离子体处理 |
| 文章编号： | 1004-5929(2003)01-0006-04 |
| 收稿时间： | 2002-10-18 |
| 修稿时间： | 2002-10-18 |
Hydrogen Plasma Process: An Effective Method to Modify Field Emission Performance of Carbon Nanotubes |
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| Abstract: | Electronic field emission from hydrogen plasma processed (HPP) multiwall carbon nanotubes (MWNT) films have been investigated. IV characteristics as well as surface morphology before and after the HPP were measured. Results showed after the HPP, emission sites densities increased dramaticallyfrom 103 cm-2 to 106cm-2. A novel configuration of carbon nanotubes named Nodular carbon nanotubes was obtained. The probably mechanism correspond to the emission properties improvement was also discussed. This approach presents an effective method to increase emission sites density and improve performance of displays based carbon nanotubes. It is very suitable for large area and low cost manufacture of field emission cathodes. |
| Keywords: | Carbon nanotubeds Field emission Hydrogen plasma process. |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |