Electron Temperature Control in Inductively Coupled Nitrogen Plasmas by Adding Argon/Helium |
| |
引用本文: | 康正德,蒲以康.Electron Temperature Control in Inductively Coupled Nitrogen Plasmas by Adding Argon/Helium[J].中国物理快报,2002,19(8):1139-1140. |
| |
作者姓名: | 康正德 蒲以康 |
| |
作者单位: | DepartmentofEngineeringPhysics,TsinghuaUniversity,Beijing100084 |
| |
摘 要: | A new technique,adding argon or helium into nitrogen plasma,has been used to regulate the electron temperature in an inductively coupled plasma.The electron temperature is determined by analysing the intensity ratio of two nitrogen spectrum lines.The results show that,when the total pressure is 0.7Pa,the electron temperature increases with the increase of the He partial pressure in He/N2 plasma,but the electron temperature decreases with the increase of the Ar partial pressure in Ar/N2k plasma.The regulation effect of electron temperature is weaker in higher pressure N2/He plasma of 2.6Pa.
|
关 键 词: | 等离子体 感应耦合等离子体 电子温度控制 |
本文献已被 维普 等数据库收录! |
|