Preparation of water-soluble photoresist derived from poly(vinyl alcohol) |
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Authors: | Kunihiro Ichimura |
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Abstract: | The reaction of PVA with 2,2-dialkoxyethoxystyrylpyridinium or quinolinium salts is described. The resultant water-soluble polymers, which contain small amounts of the styrylpyridinium- or quinolinium group, exhibited high photosensitivity. Among the polymers prepared PVA-bearing 4-oxystyrylquinolinium group was photoinsolubilized with visible light that corresponded to an argon laser. |
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