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ITO/TiO2表面电沉积CdS纳米粒子及其薄膜的光电性能
引用本文:池玉娟,付宏刚,史克英,齐乐辉,张恒彬,于海涛.ITO/TiO2表面电沉积CdS纳米粒子及其薄膜的光电性能[J].高等学校化学学报,2007,28(12):2364-2368.
作者姓名:池玉娟  付宏刚  史克英  齐乐辉  张恒彬  于海涛
作者单位:1. 哈尔滨工业大学应用化学系,哈尔滨,150001
2. 黑龙江大学化学化工与材料学院,哈尔滨,150080
基金项目:国家自然科学基金重点项目 , 国家自然科学基金
摘    要:采用阴极恒电位沉积方法, 在TiO2表面沉积制备出CdS纳米粒子. XRD和SEM测试结果表明, CdS粒子的结构以六方晶相为主, 粒径分布均匀, 表面形貌呈菜花状. 通过调节沉积电位和沉积时间等因素在一定程度上可以控制CdS纳米粒子的生长. 随着沉积电位变负, CdS粒子的粒径逐渐减小. 沉积时间越短, 粒子粒径越小. 紫外-可见吸收光谱测试结果表明, 不同条件下制备出来的CdS粒子表现出一定的量子尺寸效应. 此外, 沉积条件也会影响ITO/TiO2/CdS复合半导体薄膜的光电性能.

关 键 词:电沉积  硫化镉  复合薄膜  光电性能
文章编号:0251-0790(2007)12-2364-05
收稿时间:2007-05-14
修稿时间:2007年5月14日

Electrodeposition of CdS Nanoparticles on ITO/TiO2 Surface and the Photoelectric Performance of Their Composite Thin Films
CHI Yu-Juan,FU Hong-Gang,SHI Ke-Ying,QI Le-Hui,ZHANG Heng-Bin,YU Hai-Tao.Electrodeposition of CdS Nanoparticles on ITO/TiO2 Surface and the Photoelectric Performance of Their Composite Thin Films[J].Chemical Research In Chinese Universities,2007,28(12):2364-2368.
Authors:CHI Yu-Juan  FU Hong-Gang  SHI Ke-Ying  QI Le-Hui  ZHANG Heng-Bin  YU Hai-Tao
Institution:Department of Applied Chemistry, Harbin Institute of Technology, Harbin 150001, China; ;School of Chemistry and Materials Science, Heilongjiang University, Harbin 150080, China
Abstract:ITO/TiO2/CdS composite thin films were successfully prepared by electrodeposition of CdS nanoparticles on ITO/TiO2.The XRD and SEM results indicate that the CdS particles are hexagonal phase and the particle with cauliflower-like cluster distribute very uniformly in size.The growth of CdS nanoparticles can be effectively controlled by adjusting the electrodeposition potential and time.With the fall of potential and the decrease of time,the particle sizes decrease.The UV-Vis spectra indicate that the nanoparticles prepared under the different conditions have a very obvious size quantization effect.Furthermore,the electrodeposition conditions have very obvious effects on the photoelectronic performance of the obtained ITO/TiO2/CdS films.
Keywords:Electrodeposition  CdS  Composite thin film  Photoelectric performance
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