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Soft magnetic characteristics of an ultrathin CoFeNi free layer in spin-valve films
Authors:Hideaki Fukuzawa  Hitoshi Iwasaki  Katsuhiko KoiMasashi Sahashi
Institution:Corporate Research and Development Center, Toshiba Corporation, 1, Komukai-Toshiba cho, Saiwai-ku, Kawasaki 212-8582, Japan
Abstract:We have investigated the soft magnetic characteristics of an ultrathin Co-rich CoFeNi free layer in spin-valve films. By addition of Ni to a Co-rich CoFe free layer, magnetostriction (λλ) of the films increased positively with Ni concentration, in contrast to which a Co90Fe10 free layer showed a negatively large λλ. However, Ni addition also caused an increase in coercivity of the easy axis direction (Hce.a.). To avoid this problem, a slight decrease in the Co contents of a CoFeNi free layer was found to be effective for decreasing Hce.a.. In order to satisfy both the small λλ and Hce.a., a free layer of (Co86Fe14)88−94Ni12−6 proved to be an optimum composition in spin-valve films. Moreover, the zero λλ composition of the CoFeNi free layer was changed by a high-conductance Cu layer deposited on the free layer, which was considered to come from the lattice strain of a free layer.
Keywords:75  70  Ak  75  70  Pa  75  80  +q  85  70  Kh
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