Soft magnetic characteristics of an ultrathin CoFeNi free layer in spin-valve films |
| |
Authors: | Hideaki Fukuzawa Hitoshi Iwasaki Katsuhiko KoiMasashi Sahashi |
| |
Institution: | Corporate Research and Development Center, Toshiba Corporation, 1, Komukai-Toshiba cho, Saiwai-ku, Kawasaki 212-8582, Japan |
| |
Abstract: | We have investigated the soft magnetic characteristics of an ultrathin Co-rich CoFeNi free layer in spin-valve films. By addition of Ni to a Co-rich CoFe free layer, magnetostriction (λ) of the films increased positively with Ni concentration, in contrast to which a Co90Fe10 free layer showed a negatively large λ. However, Ni addition also caused an increase in coercivity of the easy axis direction (Hce.a.). To avoid this problem, a slight decrease in the Co contents of a CoFeNi free layer was found to be effective for decreasing Hce.a.. In order to satisfy both the small λ and Hce.a., a free layer of (Co86Fe14)88−94Ni12−6 proved to be an optimum composition in spin-valve films. Moreover, the zero λ composition of the CoFeNi free layer was changed by a high-conductance Cu layer deposited on the free layer, which was considered to come from the lattice strain of a free layer. |
| |
Keywords: | 75 70 Ak 75 70 Pa 75 80 +q 85 70 Kh |
本文献已被 ScienceDirect 等数据库收录! |
|