Growth,structure and thermal reduction of MOCVD-deposited Fe films on Al<sub>2</sub>O<sub>3</sub> (0 0 0 1) substrates期刊界 All Journals 搜尽天下杂志传播学术成果专业期刊搜索期刊信息化学术搜索

Growth,structure and thermal reduction of MOCVD-deposited Fe films on Al₂O₃ (0 0 0 1) substrates

Authors:	K.W. Liu D.Z. Shen J.Y. Zhang B.S. Li X.J. Wu Q.J. Feng Y.M. Lu X.W. Fan

Affiliation:	1. Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;2. Graduate School of the Chinese Academy of Sciences, Beijing 100049, China

Abstract:	Fe films with strong preferred orientation were prepared on Al₂O₃ (0 0 0 1) substrates by a new two-step method using low-pressure metal-organic chemical vapor deposition (LP-MOCVD) method. X-ray diffraction (XRD) and a vibrating sample magnetometer were employed to characterize the structure and magnetic properties of the Fe films before and after thermal reduction, which was performed in hydrogen flow at 723–1023 K. XRD patterns indicate that the films changed into α-Fe (bcc) mono-phase from a mixture of α-Fe₂O₃ and/or Fe (bcc).

Keywords:	Low-pressure metal-organic chemical vapor deposition Magnetic properties Thermal reduction
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