Growth,structure and thermal reduction of MOCVD-deposited Fe films on Al2O3 (0 0 0 1) substrates |
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| Authors: | KW Liu DZ Shen JY Zhang BS Li XJ Wu QJ Feng YM Lu XW Fan |
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| Institution: | 1. Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;2. Graduate School of the Chinese Academy of Sciences, Beijing 100049, China |
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| Abstract: | Fe films with strong preferred orientation were prepared on Al2O3 (0 0 0 1) substrates by a new two-step method using low-pressure metal-organic chemical vapor deposition (LP-MOCVD) method. X-ray diffraction (XRD) and a vibrating sample magnetometer were employed to characterize the structure and magnetic properties of the Fe films before and after thermal reduction, which was performed in hydrogen flow at 723–1023 K. XRD patterns indicate that the films changed into α-Fe (bcc) mono-phase from a mixture of α-Fe2O3 and/or Fe (bcc). |
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| Keywords: | Low-pressure metal-organic chemical vapor deposition Magnetic properties Thermal reduction |
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