Metallurgical applications of SIMS |
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Authors: | F. Degrè ve, N. A. Thorne J. M. Lang |
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Affiliation: | (1) Cégédur Péchiney, Centre de Recherche et Développement, BP 27, F-38340 Voreppe, France |
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Abstract: | Summary This paper reviews the unique advantages provided by Secondary Ion Mass Spectrometry (SIMS) for the characterization of heterogeneous conducting metallurgical samples: detection and imaging of the lateral distribution of every element (H-U), even at very low concentration and excellent depth resolution in the nanometer range. The advantages brought by coupling SIMS with other conventional microscopical and microanalytical techniques (SEM, EPMA, TEM/STEM) are illustrated by examples taken from the author's laboratory: quantitative analysis of the solid solution and within phases, surface, thin film and interface analysis by depth profiles. Special attention will be brought to the advantages of Ion Microscopy and the importance of high mass resolution. The difficulties associated with the variations of sputtering rate and ionization probability in multiphase systems will also be discussed.
Anwendungen von SIMS in der Metallurgie |
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