首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Second harmonic generation in In2O3–SiON films doped by Al and Sn
Authors:I V Kityk  B Sahraoui  K J Plucinski
Institution:a Institute of Physics WSP, Al. Armii Krajowej 13/15, Czestochowa, Poland;b Institute of Computer Modelling, Institute Physics WSP, Cracow Technological University, Al. Armii Krajowej 13/15, Warsaw str. 24, Cracow 42 200, Poland;c Laboratoire POMA, Universite d'Angers, Angers, France;d MAT, ul. Kaliskiego 2, Warsaw, Poland
Abstract:Photoinduced optical and second-order non-linear optical effects in the interfaces separating In2O3–SiON (O/N ratio equals 1) films doped with A1, Sn and glass substrates were investigated using the photoinduced optical second harmonic generation. The photoinduced effective second-order optical susceptibility deff (at λ=1.76 μm) shows a good correlation with the linear optical susceptibility, particularly with the shift of the absorption edge. The maximal response of the photoinduced optical response signal was observed for the pump–probe delaying time of 34 ps. The performed experimental measurements indicate that the observed effects are mainly caused by the interface potential gradients on the border glass–In2O3–SiON film and by additional polarization due to insertion of the Al and Sn atoms. The observed phenomenon may be proposed as a sensitive tool for investigation of thin semiconducting interfacial layers and simultaneously such films may be used as materials for non-linear optical devices.
Keywords:Second harmonic generation  Thin films  SiON
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号