Tunable Ba0.5Sr0.5TiO3 film bulk acoustic resonators using SiO2/Mo Bragg reflectors |
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Authors: | Yang Tian-Ying Jiang Shu-Wen Li Ru-Guan Jiang Bin |
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Affiliation: | State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China |
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Abstract: | Tunable and switchable Ba0.5Sr0.5TiO3 film bulk acoustic resonators (FBARs) based on SiO2/Mo Bragg reflectors are explored, which can withstand high temperature for the deposition of BaxSr1-xTiO3 (BST) films at 800 ℃. The dc bias-dependent resonance may be attributed to the piezoelectricity of the BST film induced by an electrostrictive effect. The series resonant frequency is strongly dc bias-dependent and shifts downwards with dc bias increasing, while the parallel resonant frequency is only weakly dc bias-dependent and slightly shifts upwards at low dc bias (< 45 V) while downwards at higher dc bias. The calculated relative tunability of shifts at series resonance frequency is around -2.3% and the electromechanical coupling coefficient is up to approximately 8.09% at 60-V dc bias, which can be comparable to AlN FBARs. This suggests that a high-quality tunable BST FBAR device can be achieved through the use of molybdenum (Mo) as the high acoustic impedance layer in a Bragg reflector, which not only provides excellent acoustic isolation from the substrate, but also improves the crystallinity of BST films withstanding higher deposition temperature. |
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Keywords: | BaxSr1-xTiO3 tunable film bulk acoustic wave resonator ferroelectric acoustic Bragg reflector |
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