Generation of acidity of silica monolayer by network of SI-O-SI on alumina |
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| Authors: | Naonobu Katada Takuya Toyama Miki Niwa Takahiro Tsubouchi Yuichi Murakami |
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| Institution: | 1. Department of Materials Science, Faculty of Engineering, Tottori University, Tottori 680, Koyama-cho, Japan
2. Department of Applied Chemistry, School of Engineering, Nagoya University, Nagoya 464-01, Chikusa-ku, Japan
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| Abstract: | Structures of materials deposited from various Si alkoxides on alumina were determined based on gravimetry, product analysis
and coverage measurement. The activity for double-bond isomerization of l-butene was observed over the silica monolayer with a network of siloxanes (Si-O-Si) deposited from Si(OCH3)4 at 493 and 593 K. However, the isolated silica species deposited from Si(OCH3)4 at low temperatures (≤ 423 K) and those deposited from Si(OCH3)n(CH3)4-n (n ≥ 3) showed almost no activity. Based on these findings, the species — Al-O-SiOH in the network of Si-O-Si was suggested
to be the Bronsted acid site. |
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