Reaction of gaseous hydrogen fluoride with aluminium and its compounds |
| |
Authors: | O. Pitton, C.K. J rgensen,H. Berthou |
| |
Affiliation: | Alusuisse Research Laboratories, CH-8212 Neuhausen am Rheinfall, Switzerland Département de Chimie minérale, analytique et appliquée, Université de Genève CH-1211 Geneva 4, Switzerland |
| |
Abstract: | The reaction of metallic aluminium surfaces, aluminium oxides, hydrated oxides and sulphate with gaseous anhydrous hydrogen fluoride was studied at 470°C and pressures between 10 and 100 torr. The complementary analytical techniques of X-ray induced photoelectron spectra, X-ray and electron diffraction, and electron microscopy were used for identifying the (frequently unexpected) products. |
| |
Keywords: | |
本文献已被 ScienceDirect 等数据库收录! |
|