RF magnetron sputtering of ZnO and Al-doped ZnO films from ceramic and nanopowder targets: a comparative study |
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Authors: | Y Bouznit Y Beggah K Djessas |
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Institution: | 1.Laboratoire d’Etude des matériaux (LEM),Université de Jijel,Ouled Aissa, Jijel,Algeria;2.Laboratoire de Mathématiques et Physique des Systèmes (MEPS),Université de Perpignan,Perpignan Cedex,France |
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Abstract: | Undoped zinc oxide (ZnO) and aluminium-doped zinc oxide (ZAO) thin films have been prepared on glass substrates by RF magnetron
sputtering from ceramic and nanopowder targets at room temperature (RT). The effects of target nature on the properties of
the films have been studied. The X-ray diffraction (XRD) patterns show that ZnO and Al-doped ZnO thin films are highly textured
along the c-axis perpendicular to the surface of the substrate from either nanopowder or ceramic targets. From the SEM images,
it appears that the surface morphologies of ZAO films exhibit difference from that of undoped ZnO films. All films exhibit
a transmittance higher than 80% in the visible region. The optical band gap (Eg) of ZnO and ZAO films obtained from nanopowder target is higher than those prepared using ceramic target. In two cases, Al-doping
leads to a larger optical band gap (Eg) of the films. |
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