| Affiliation: | Jun Chang 1,Meifang Zou 1,Ruirui Wang 1,Shulong Feng 2,and M.M.Talha 3 1 Laboratory of Optoelectronics Technology and Information System,School of Optoelectronics,Beijing Institute of Technology,Beijing 100081,China 2 Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 343100,China 3 IICS,P.O.Box No.1384,Islamaabad,Pakistan |
| Abstract: | All-reflective optical systems,due to their material absorption and low refractive index,are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).In this letter,we present a design for an all-reflective lithographic projection lens.We also discuss its design idea and structural system.After analysis of the four-mirror optical system,the initial structural parameters are determined,the optical system is optimized,and the tolerances of the system are analyzed.We also show the imp... |
