Effect of additives on the chemical vapour generation of bismuthane by tetrahydroborate(III) derivatization

The effect of mM concentrations of K₃Fe(CN)₆], Fe(III), Mo(VI), KSCN and KMnO₄ on the generation of BiH₃ by the reaction of 0.2–10 μg ml⁻¹ Bi(III) with 0.2 M tetrahydroborate(III) at 1 M acidity (HCl or HNO₃) was investigated. Chemical vapour generation (CVG) of BiH₃ was investigated by atomic absorption spectrometry using a continuous flow reaction system (CF–CVG–AAS) and different mixing sequences and reagent reaction times. Gas chromatography–mass spectrometry (GC–MS) was employed in batch generation experiments with NaBD₄. In the absence of additives, the formation of Bi⁰ at high concentrations of Bi(III) caused rollover of calibration curves and limited the linear range to less than 1 μg ml⁻¹ Bi(III). In the presence of additives, the formation of Bi⁰ was not observed and the linear range was increased to 5 μg ml⁻¹ of Bi(III) while rollover was completely removed. GC–MS experiments indicated that the presence of additives did not affect the direct transfer of H from boron to bismuth. Experiments with CF–CVG–AAS and different mixing sequences and reagent reaction times suggest that additives act by preventing the formation of Bi⁰ through the formation of reaction intermediates which evolve towards the formation of BiH₃ at elevated Bi(III)/NaBH₄ ratios.