| Abstract: | Novel photosensitive polymers were synthesized by the copolymerization of methyl methacrylate and 1,2,3,4-tetrahydro-1-naphthylideneimino p-styrenesulfonate (NISS) and by the ternary polymerization of methyl methacrylate, methacrylic acid, and 9-fluorenylideneiminop-styrene-sulfonate (FISS). NISS and FISS units showed good sensitivity to light of wavelengths below 300 nm and below 366 nm, respectively. Although the polymers were insoluble in aqueous alkaline solutions, on irradiation with UV light they became soluble in aqueous alkaline solutions. A remarkable decrease in molecular weight of the polymers was observed during the photolysis of imino sulfonate groups incorporated into the polymers, which assisted the dissolution of the irradiated polymers. |
