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Growth and characterization of thin ZnO films deposited on glass substrates by electrodeposition technique |
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| Authors: | T. Mouet T. Devers Z. Messai K. Konstantinov M.T. Ta |
| Affiliation: | a Institut PRISME, Université d’Orléans, LESI-IUT de Chartres, EA 1715, 21 rue Loigny la Bataille, 28000 Chartres, France b Laboratoire de Micro-système et Instrumentation, département d’électronique, faculté des sciences de l’ingénieur, Université Mentouri de Constantine, Route de Ain el-Bey, 25000 Constantine, Algeria c University of Wollongong, Engineering Faculty, Institute for Superconducting and Electronic Materials, 2522 Wollongong, Australia d Laboratoire de Microscopies et d’Étude de Nanostructures, UFR Sciences, B.P. 1039, 51687 Reims Cedex, France |
| Abstract: | Electrodeposition technique was used in order to produce nanometric zinc oxide films on glass insulating substrates. The effect of electrolyte concentration and applied current density on the formation and growth of electrodeposited Zn thin films in aqueous solutions of ZnSO4 were studied. After a thermal oxidation, a characterization of the structural morphology of the films deposited was carried out by optical microscopy (OM), atomic force microscopy (AFM), scanning electron microscopy (SEM) and by grazing incidence X-rays diffraction (GIXD). These characterization techniques show that the grains size of the films after oxidation at temperature 450 °C is between 5 and 15 nm, as well as the structure is polycrystalline nature with several orientations. UV/vis spectrophotometry confirms that it is possible to obtain transparent good ZnO films with an average transmittance of approximately 80% within the visible wavelength region, as well as the optical gap of obtained ZnO films is 3.17 eV. |
| Keywords: | Electrodeposition ZnO Dendritic deposits Thin film Nanostructure |
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