Mo/Si软X射线多层膜的界面粗糙度研究

 用磁控溅射法分别制备了以Mo膜层和Si膜层为顶层的Mo/Si多层膜系列, 利用小角X射线衍射确定了各多层膜的周期厚度。以不同周期数的Mo/Si多层膜的新鲜表面近似等同于同一多层膜的内界面，通过原子力显微镜研究了多层膜界面粗糙度随膜层数的变化规律。并在国家同步辐射实验室测量了各多层膜的软X射线反射率。研究表明：随着膜层数的增加，Mo膜层和Si膜层的界面粗糙度先减小后增加然后再减小，多层膜的峰值反射率先增加后减小。

Interface roughness of Mo/Si soft X-ray multilayers

A series of Mo/Si multilayers were prepared by magnetron sputtering,with top layers being Mo layer and Si layer respectively.Periodic length of Mo/Si multilayers were determined by small angle X-ray diffraction.As fresh surfaces of Mo/Si multilayers with different period number were approximatively equal to the interface of the same multilayer,interface roughness change law of multilayers as layer number increases was studied by atomic force microscope.Soft X-ray reflectivity of Mo/Si multilayers were measured in National Synchrotron Radiation Laboratory.As the number of layers increases,interface roughness and peak reflectivity of multilayers first increase and then reduce.