图案化TiO2薄膜的制备技术

本文综述了图案化TiO2薄膜的制备技术，按图案的生成方式可分为图案的直接生成，掩膜复制法，硬质模板复制法三大类。可以通过针尖写蚀法、电子书写蚀法、激光写蚀法、自组装法、光电化学法直接制备图案。掩膜复制法包括光刻胶法、自组装膜法、光敏凝胶膜法等。硬质模板法也称软刻蚀技术，分为复制微模塑、转移微模塑、毛细管微模塑、微接触印刷法、光-盖印印刷等技术。对每类方法的优缺点作了适当评述，对今后图案化TiO2薄膜制备的研究方向提出了一些建议。

Preparation of Patterned TiO2 Thin Films

This article provides an overview of various patterning methodologies of TiO2 films, and it is organized into three major sections: Generation of patterns, replication of a mask, and replication of a master. Generation of patterns is usually accomplished by serial techniques, including the writhing process with a stylus, an electron beam or a laser beam, the self-assembly process and the photoelectromchemistry process. The patterned features on a mask are mainly used to direct a flux of radiation or physical matter from a source onto a substrate. This method can be carried out with photoresists, self assembled monolayers, and photosensitive gel films of TiO2. A master serves as the original for replication based on replica molding, transfer molding, molding in capillaries, microcontact printing and light stamping. The advantages and disadvantages of different methods are described. Some opinions on further studies on the preparation of patterned TiO2 films are also presented.