Incident angle and temperature dependence of WSi wire-grid polarizer |
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| Institution: | 1. HUSLAB, Department of Virology and Immunology, Helsinki University Central Hospital, Helsinki, Finland;2. Haartman Institute, Department of Virology, University of Helsinki, Helsinki, Finland;3. School of Pharmacy, University of Eastern Finland, Kuopio, Finland;4. Haartman Institute, Department of Bacteriology and Immunology, University of Helsinki, Helsinki, Finland;5. Department of Clinical Virology, Institute of Biomedicine, Sahlgrenska Academy, University of Gothenburg, Gothenburg, Sweden.;6. Faculty of Veterinary Medicine, Department of Veterinary Biosciences, University of Helsinki, Helsinki, Finland |
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| Abstract: | The dependences of the incident angle and thermal durability of a tungsten silicide (WSi) wire-grid polarizer were examined. A WSi grating with a 0.5 fill factor, 260 nm depth, and 400 nm period was formed on a Si surface using two-beam interference and dry etching. The TM transmission spectrum of the fabricated element was greater than 60% at the incident angle of θ = 40° (the angle between the incident direction and the perpendicular axis to the grating direction) in the 4–10 μm wavelength range. An extinction ratio of 22.2 dB was achieved at 2.5 μm wavelength. Additionally, results show that this polarizer has higher thermal resistance than that of commercial infrared polarizers. Therefore, this polarizer is effective for taking a polarized thermal image of high temperatures. |
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| Keywords: | Infrared wire-grid polarizer Tungsten silicide Incident angle |
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