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Carbon nitride films synthesized by nitrogen ion beam bombarding on C60 films
Authors:Z.-M. Ren  Y.-C. Du  Z.-F. Ying  F.-M. Li  J. Lin  Y.-Z. Ren  X.-F. Zong
Affiliation:(1) T.D. Lee Physics Laboratory, Department of Physics, Fudan University, State key joint laboratory for materials modification by laser, ion, and electron beams, Shanghai 200433, China, CN;(2) Institute of Materials Science, Fudan University, Shanghai 200433, China, CN
Abstract:
valunit*{400}{eV} or ) nitrogen ion beam was used to bombard films to synthesize carbon nitride films. The bombarded films were examined by Raman and X-ray photoelectron spectroscopy (XPS) measurements. The experimental results showed that the destroyed carbon species chemically combined with nitrogen ions to form stable carbon nitride. An appropriate beam energy (possibly ) was proposed in this method. Received: 1 July 1996/Accepted: 27 November 1996
Keywords:PACS: 81.15.Jj   61.14.-x   61.70.Tm
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