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退火参数对熔石英透射波前和损伤阈值的影响
引用本文:向霞,郑万国,袁晓东,蒋勇,戴威,黄进,王海军,李熙斌,吕海兵,贺少勃,祖小涛.退火参数对熔石英透射波前和损伤阈值的影响[J].强激光与粒子束,2011,23(9).
作者姓名:向霞  郑万国  袁晓东  蒋勇  戴威  黄进  王海军  李熙斌  吕海兵  贺少勃  祖小涛
作者单位:1. 中国工程物理研究院 激光聚变研究中心, 四川 绵阳 621900; 2. 电子科技大学 物理电子学院, 成都 610054
基金项目:国家高技术发展计划项目; 电子科技大学青年基金项目(L08010401JX0806)
摘    要: 采用高温退火技术去除熔石英元件表面由于CO2激光修复带来的残余应力,研究了退火环境对元件的表面污染,分析了不同退火温度(600~900 ℃)和保温时间(3~10 h)对于元件残余应力、透射波前、表面粗糙度和激光损伤阈值的影响。结果表明:在800 ℃以下,高温退火10 h可有效去除CO2激光修复带来的残余应力,对元件的透射波前和表面粗糙度无明显影响;石英保护盒能有效减少退火环境对元件表面产生的污染,但仍有X射线光电子能谱检测不到的表面污染物存在;在退火后采用质量分数为1%的HF刻蚀15 min,激光损伤阈值可恢复,同时元件透射波前和表面粗糙度并无明显的增加。

关 键 词:熔石英  残余应力  热退火  损伤阈值  透射波前
收稿时间:1900-01-01;

Effects of annealing parameters on transmission wavefront and damage threshold of fused silica
Xiang Xia,ZhengWanguo,Yuan Xiaodong,Jiang Yong,Dai Wei,Huang Jin,Wang Haijun,Li Xibin,Lü Haibing,He Shaobo,Zu Xiaotao.Effects of annealing parameters on transmission wavefront and damage threshold of fused silica[J].High Power Laser and Particle Beams,2011,23(9).
Authors:Xiang Xia  ZhengWanguo  Yuan Xiaodong  Jiang Yong  Dai Wei  Huang Jin  Wang Haijun  Li Xibin  Lü Haibing  He Shaobo  Zu Xiaotao
Institution:(1. Research Center of Laser Fusion, CAEP, P.O. Box 919-988, Mianyang 621900, China; 2. School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China)
Abstract:Thermal annealing at high temperature is used to relieve the residual stress of fused silica induced by CO2 laser repair. The effects of annealing environment on surface contamination of fused silica as well as the effects of different annealing temperatures (600 to 900 ℃) and time (3 to 10 h) on residual stress, transmission wavefront, surface roughness, and laser induced damage threshold (LIDT) are investigated. The results show that the residual stress induced by CO2 laser repair can be effectively relieved after annealing at 800 ℃ for 10 h and there is no obvious change in the wavefront and surface roughness of optics. A silica shield box can reduce surface contamination from annealing environment but there are still some contaminations undetectable for X-ray photoelectron spectrosco
Keywords:fused silica  residual stress  thermal annealing  damage threshold  transmission wavefront  
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